The E-Beam Assist Magnetron Sputter System is a physical vapor deposition facility designed for the fabrication and treatment of high-quality functional thin films. The system integrates three 3-inch RF magnetron sputtering sources, a load-lock chamber, automated sample transfer, substrate heating and rotation, and an electron-beam assist source.

It supports single-layer, multilayer, and co-sputtered deposition of metals, semiconductors, oxides, nitrides, and insulating materials on substrates up to 100 mm in diameter. Electron-beam irradiation can be applied during or after deposition to tailor film density, crystallinity, electrical conductivity, optical properties, and interfacial stability.

The system is used to develop advanced materials and coatings for harsh space environments, including atomic-oxygen-resistant coatings, thermal-control films, radiation-tolerant materials, sensor-integrated structures, and multicomponent functional thin films.