2019 High mobility SiGe growth by using the molten target sputtering (MTS) within heteroepitaxy framework
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작성자 최고관리자 작성일 25-08-20 16:02본문
- Journal
- Scientific Report, 11555, August
- Status
- Published
- Year
- 2019
-
- 이전글Fabrication method, characteristics and applications of cellulose nano fiber (CNF) film 25.08.20
- 다음글Photon sieve design and fabrication for imaging characteristics using UAV flight 25.08.20
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